Tech Area / Field. Brief Description of TechnologyWe are developing a production technology for multilayer X-ray mirrors in the soft X-ray region (l = 0.1 - 30 nm)

• FIR-INS: Fission Reactors / Nuclear Instrumentation
• INF-ELE: Information and Communications / Microelectronics and Optoelectronics
• MAT-SYN: Materials / Materials Synthesis and Processing
• PHY-OPL: Physics / Optics and Lasers

Brief Description of Technology
We are developing a production technology for multilayer X-ray mirrors in the soft X-ray region (l = 0.1 - 30 nm). Multilayer X-ray optics were used as dispersive elements for the X-ray fluorescence analysis of the light elements, for the imaging and X-ray diagnostics of high-temperature plasma (laser plasma, Z-pinch), for the creation of X-ray telescopes under the "Fobos” and "Coronas" space programs, for the creation of multichannel devices (polychromators) for the diagnostics of high-temperature plasma, as well as for the creation of a project for X-ray lithography.

In our opinion, a multilayer mirror based on Cr/Sc, which is effectively applied in the X-ray fluorescent analysis of nitrogen (periods of multilayer structures d = 4.0 and 5.5 nm), the creation of polarimeters in the field of a “water window” (l = 2.16 - 4.5 nm), and the creation of imaging optics for radiation lines of ions C V (l = 4.03 nm) and C VI (l = 3.37 nm) is of particular interest.

For the realization of work in the area of multilayer X-ray optics, the IPM of the RAS is creating an appropriate complex of technological and research equipment. The complex includes technological installations for the preparation of multilayer structures with periods of d = 1.0 - 15 nm and apertures up to 300 mm through magnetron spattering, pulsed laser deposition and ion-beam spattering. The research complex includes systems for the X-ray investigation of the properties of large-area multilayer mirrors with complex forms of a surface in the range of soft X-ray (l = 0.83 - 50 nm) and hard X-ray radiation (l = 0.1-0.2 nm), a Jeol - 2000 electronic microscope of high spatial resolution, as well as equipment and techniques for the high-resolution Auger depth profiling of multilayer structures.

Several researchers of the IPM were awarded a State Prize for a research cycle in the area of multilayer X-ray optics.

Scientific Papers
S.I. Zheludeva, M.V. Kovalchuk, N.N. Novikova, A.N. Sosphenov, N.E. Malyshheva, N.N. Salashchenko, A.D. Akhsakhalyan, Yu.Ya. Platonov. Investiyation of heat treatment effect on Ni/C bilayer parameters by long periodic X-ray standing waves. Physica B, 1994, 198, p.259-261.

V.A.Slemzin, I.A.Zhitnik, E.N.Ragozin, E.A.Andreev, N.N.Salashchenko, Yu.Ya.Platonov. Aspherical imaging multilayer mirrors with sub-aresecond resolution for solar XUV-telescope. SPIE Proc.,1994, 2279, p.234.

N.N.Salashchenko, Yu.Ya.Platonov, S.Yu.Zuev. Multilayer X-ray optics for synchrotron radiation. NIM, 1995, A359, p.114-120.

L.A.Shmaenok, Yu.Ya.Platonov, N.N.Salashchenko, A.A.Sorokin, D.M.Simanovskii, A.A.Golubev, V.P.Belik, S.V.Bobashev, A.Yu.Grudsky, F.Bijkerk. Multilayer EUV polychromator for plasma diagnostics. Proc.11 Intern.conf.VUV-95, Japan, 1995; J Electr. Spectr., 1996.

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